The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Jan. 17, 2008
Applicants:
Seiji Ishikawa, Kawasaki, JP;
Jun Ooida, Mobara, JP;
Yoshinori Muramatsu, Tokyo, JP;
Takahiro Miyazaki, Mobara, JP;
Inventors:
Seiji Ishikawa, Kawasaki, JP;
Jun Ooida, Mobara, JP;
Yoshinori Muramatsu, Tokyo, JP;
Takahiro Miyazaki, Mobara, JP;
Assignee:
Hitachi Displays, Ltd., Chiba, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 9/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure method that suppresses distribution of pattern shapes at the time of exposure. In a manufacturing method for a display unit, a layer forming a reference for pattern arrangement is determined among layers formed on a panel. An arrangement of a pattern in a layer above the reference layer is determined using a value obtained from distribution of the pattern arrangement in the reference layer.