The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2011

Filed:

May. 18, 2010
Applicants:

Jesus Flores, El Paso, TX (US);

Scott A. Tufts, Leawood, KS (US);

Angel G. Magallon, El Paso, TX (US);

James R. Bardwell, El Paso, TX (US);

Inventors:

Jesus Flores, El Paso, TX (US);

Scott A. Tufts, Leawood, KS (US);

Angel G. Magallon, El Paso, TX (US);

James R. Bardwell, El Paso, TX (US);

Assignee:

Carefusion 2200, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B43K 5/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

An applicator for reducing the concentration of unwanted chemicals such as para-chloroaniline (PCA) from an antiseptic solution includes an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and at least one hydrophobic or hydrophilic material. The hydrophobic or hydrophilic material selectively removes undesired by-products from the antiseptic solution when the antiseptic solution contacts the hydrophobic or hydrophilic material. A method for selectively removing unwanted by-products from an antiseptic solution includes the steps of providing an antiseptic solution in amount sufficient to have an antimicrobial effect on a surface and contacting the antiseptic solution with at least one hydrophobic or hydrophilic material that selectively removes the unwanted by-products from the antiseptic solution.


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