The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Mar. 13, 2008
Mamoru Yorimoto, Tokyo, JP;
Noboru Sawayama, Kanagawa, JP;
Kenichi Kawabata, Kanagawa, JP;
Tetsu Morino, Kanagawa, JP;
Tetsuro Hirota, Kanagawa, JP;
Takumi Hagiwara, Aichi, JP;
Mamoru Yorimoto, Tokyo, JP;
Noboru Sawayama, Kanagawa, JP;
Kenichi Kawabata, Kanagawa, JP;
Tetsu Morino, Kanagawa, JP;
Tetsuro Hirota, Kanagawa, JP;
Takumi Hagiwara, Aichi, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
An adjustment pattern, which is composed of a reference pattern made of plural independent liquid droplets and a pattern to be measured made of plural independent liquid droplets ejected under an ejection condition different from the reference pattern, is formed on a water-repellent conveying belt. Then, light is applied to the adjustment pattern to receive the regular reflection light from the adjustment pattern, so that the adjustment pattern is scanned. The distance between the respective patterns is measured based on the measured result. Finally, liquid droplet ejection timing of the recording head is corrected based on the result thus measured.