The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2011

Filed:

Aug. 16, 2007
Applicant:

Keigo Hino, Koriyama, JP;

Inventor:

Keigo Hino, Koriyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03B 37/018 (2006.01);
U.S. Cl.
CPC ...
Abstract

An object of the invention is to provide a process for producing a synthetic quartz glass while taking account of a refractive index distribution remaining in the synthetic quartz glass; a jig for use in the synthetic-quartz-glass production process; and a synthetic quartz glass for an optical member, produced by the process. A process for producing a synthetic quartz glass, which comprises: depositing and growing fine quartz glass particles synthesized by flame hydrolysis of a glass-forming material on a rotating target to thereby form a porous quartz glass base of a substantially cylindrical shape; presintering the porous quartz glass base; and heating the presintered porous quartz glass base to a temperature not lower than the vitrification temperature to convert the base into a transparent glass, wherein in the step of conversion into a transparent glass, the porous quartz glass base is placed so as to make its growth axis vertical and a load is vertically imposed on the thus-placed porous quartz glass base.


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