The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Jun. 30, 2009
Shohei Hata, Yokohama, JP;
Naoki Matsushima, Yokohama, JP;
Toshiaki Takai, Yokohama, JP;
Yukio Sakigawa, Fujisawa, JP;
Satoshi Arai, Yokohama, JP;
Shohei Hata, Yokohama, JP;
Naoki Matsushima, Yokohama, JP;
Toshiaki Takai, Yokohama, JP;
Yukio Sakigawa, Fujisawa, JP;
Satoshi Arai, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A filter element includes a first glass substrate having a pair of parallel surfaces and a band pass filter arranged on one of the parallel surfaces, a pair of single-crystal substrates (Si wafers) each including a primary surface formed with a depression having an inclined surface with respect to the primary surface occupying at least one half of the opening of the depression, and a second glass substrate having an optical element. The primary surfaces of the single-crystal substrate pair are bonded to a pair of the surfaces of the glass substrate. The depressions are faced through the glass substrate and surround the band pass filter. By this configuration, the filter element can be mass produced with a high accuracy and a low cost by the wafer-level process.