The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2011

Filed:

Jun. 29, 2007
Applicants:

Justin E. Jureller, Chicago, IL (US);

Hee Y. Kim, Chicago, IL (US);

Norbert F. Scherer, Winnetka, IL (US);

Inventors:

Justin E. Jureller, Chicago, IL (US);

Hee Y. Kim, Chicago, IL (US);

Norbert F. Scherer, Winnetka, IL (US);

Assignee:

The University of Chicago, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A rapid-sampling stochastic scanning multiphoton multifocal microscopy (SS-MMM) fluorescence imaging technique enables multiparticle tracking at rates upwards of 1,000 times greater than conventional single point raster scanning. Stochastic scanning of a diffractive optical element may generate a 10×10 hexagonal array of foci with a white noise driven galvanometer to yield a scan pattern that is random yet space-filling. SS-MMM may create a more uniformly sampled image with fewer spatio-temporal artifacts than obtained by conventional or multibeam raster scanning.


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