The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 2011

Filed:

Jan. 06, 2010
Applicants:

Kazunori Sugiyama, Tokyo, JP;

Yuuichi Oomori, Tokyo, JP;

Minako Shimada, Tokyo, JP;

Inventors:

Kazunori Sugiyama, Tokyo, JP;

Yuuichi Oomori, Tokyo, JP;

Minako Shimada, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/38 (2006.01); C08F 218/00 (2006.01); C09K 3/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

To provide a method for producing a water/oil repellent composition which can impart water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability) and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A method for producing a water/oil repellent composition which comprises polymerizing a monomer component comprising the following monomer (a) in coexistence with the following compound (x) in a medium in the presence of a surfactant and a polymerization initiator: monomer (a) is a compound of the formula (Z—Y)X wherein Z is a Cpolyfluoroalkyl group or the like, Y is a bivalent organic group or a single bond, n is 1 or 2, and X is a polymerizable unsaturated group; and the compound (x) is a compound having at least two groups of —(CH)—CHR—(CH)—SH, wherein Ris a methyl group or an ethyl group, a is an integer of from 0 to 2, and b is 0 or 1.


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