The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Sep. 05, 2006
Peter Zandbergen, Hechtel-Eksel, BE;
Jeroen H Lammers, Eindhoven, NL;
David Van Steenwinckel, Holsbeek, BE;
Peter Zandbergen, Hechtel-Eksel, BE;
Jeroen H Lammers, Eindhoven, NL;
David Van Steenwinckel, Holsbeek, BE;
NXP B.V., Eindhoven, NL;
Abstract
The present invention provides a method of lithographic patterning. The method comprises: applying to a surface to be patterned a photoresist () comprising a polymer resin, a photocatalyst generator which generates a catalyst on exposure to actinic radiation, and a quencher; exposing the photoresist () to actinic radiation through a mask pattern (); carrying out a post-exposure bake; and then developing the photoresist () with a developer to remove a portion of the photoresist which has been rendered soluble in the developer. Either the polymer resin is substantially insoluble in the developer prior to exposure to actinic radiation and rendered soluble in the developer by the action of the catalyst, and by the action of the quencher during the bake, or the polymer resin is soluble in the developer prior to exposure to actinic radiation and rendered substantially insoluble in the developer by the action of the catalyst, and by the action of the quencher during the bake.