The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Jun. 19, 2006
Eckhard Prinz, Hamfelde, DE;
Peter Palm, Hamburg, DE;
Frank Forster, Hamburg, DE;
Softal Corona & Plasma GmbH, Hamburg, DE;
Abstract
A method for continuous atmospheric plasma treatment of an electrically insulating workpiece. The workpiece is arranged at a distance beneath at least one high-voltage electrode which extends across a direction of movement. The electrode and the workpiece are set in motion relative to one another. The high voltage being applied to the high-voltage electrode, preferably is in the form of an AC voltage. A first space situated between the high-voltage electrode and the workpiece is filled with a first atmosphere and a second space on the side of the workpiece facing away from the high-voltage electrode is filled with a second atmosphere that is different from the first atmosphere. The second space is adjacent to a back side of the workpiece. The choice of high voltage and of the first and second atmospheres is made in such a way that a plasma discharge is ignited in the second atmosphere.