The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Nov. 30, 2007
Applicants:
Zvonimir Z. Bandic, San Jose, CA (US);
Michael A. Moser, San Jose, CA (US);
Inventors:
Zvonimir Z. Bandic, San Jose, CA (US);
Michael A. Moser, San Jose, CA (US);
Assignee:
Hitachi Global Storage Technologies, Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 21/02 (2006.01); G08B 13/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
Embodiments of the present invention recite a method and system for fabricating a data storage medium. In one embodiment, a detectable pattern is created at the surface of a substrate. An electron beam lithography process is then initiated upon the substrate. The detectable pattern is used to control the positioning of an electron beam relative to the surface of the substrate during the electron beam lithography process.