The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Jul. 22, 2005
Angela T. Hui, Fremont, CA (US);
Hiroyuki Kinoshita, San Jose, CA (US);
Unsoon Kim, San Jose, CA (US);
Harpreet K. Sachar, Milpitas, CA (US);
Angela T. Hui, Fremont, CA (US);
Hiroyuki Kinoshita, San Jose, CA (US);
Unsoon Kim, San Jose, CA (US);
Harpreet K. Sachar, Milpitas, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Spansion LLC, Sunnyvale, CA (US);
Abstract
A method for forming a memory device includes forming a hard mask over a substrate, where the hard mask includes a first mask layer and a second mask layer formed over the first mask layer. The substrate is etched to form a trench. The trench is filled with a field oxide material. The second mask layer is stripped from the memory device using a first etching technique and the first mask layer is stripped from the memory device using a second etching technique, where the second etching technique is different than the first etching technique.