The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Dec. 20, 2007
Jean-charles Barbe, Grenoble, FR;
Erwan Dornel, Vern sur Seiche, FR;
Francois DE Crecy, Seyssins, FR;
Joel Eymery, Sassenage, FR;
Jean-Charles Barbe, Grenoble, FR;
Erwan Dornel, Vern sur Seiche, FR;
Francois De Crecy, Seyssins, FR;
Joel Eymery, Sassenage, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
A method for forming a wire in a layer based on a monocrystalline or amorphous material. The method forms two trenches in the layer, crossing through one face of the layer, separated from each other by one portion of the layer, by an etching of the layer on which is arranged an etching mask, and anneals, under hydrogenated atmosphere, the layer, the etching mask being maintained on the layer during the annealing. The depths and widths of the sections of the two trenches, and the width of a section of the portion of the layer, are such that the annealing eliminates a part of the portion of the layer, the two trenches then forming a single trench in which a remaining part of the portion of the layer forms the wire.