The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Jun. 13, 2006
Applicant:
Brian Bottema, Austin, TX (US);
Inventor:
Brian Bottema, Austin, TX (US);
Assignee:
Freescale Semiconductor, Inc, Austin, TX (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A tool for forming a desired pattern on a polishing pad establishes a vibration that is coupled to the polishing pad. The vibration removes small portions of the polishing pad according to the desired pattern. The polishing pad is then used in a chemical mechanical polishing (CMP) step to polish a layer on a semiconductor device.
Bottema, Brian. (2011). Method of polishing a layer using a polishing pad (U.S. Patent No. 7985122). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7985122
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile