The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Nov. 14, 2007
Applicants:
Thomas J. Aton, Dallas, TX (US);
Carl A. Vickery, Garland, TX (US);
Inventors:
Thomas J. Aton, Dallas, TX (US);
Carl A. Vickery, Garland, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database, the drawn pattern data describing device circuit features and dummy features. The dummy features have first target patterns. Mask pattern data is generated for the dummy features, wherein one or more of the dummy features have second target patterns that are different from the first target patterns. The mask pattern data is corrected for proximity effects.