The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Jan. 05, 2009
Applicant:
Kuo-kuei Fu, Taoyuan County, TW;
Inventor:
Kuo-Kuei Fu, Taoyuan County, TW;
Assignee:
Nanya Technology Corp., Tao-Yuan Hsien, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a matching method of pattern layouts from inverse lithography, which makes the pattern cells in the same groups identical to avoid a repeated verification and to improve the yield. The method comprises the step of: analyzing a target designed layout by hierarchy; categorizing the pattern cells with the same shape into a group; inversing the target designed layout by inverse lithography; inspecting the inversed pattern cells in the group with each other and replacing the variant ones to make all the inversed pattern cells identical.