The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2011

Filed:

Dec. 17, 2009
Applicants:

Krzysztof Kozaczek, Midway, UT (US);

Sterling Cornaby, Springville, UT (US);

Steven Liddiard, Springville, UT (US);

Charles Jensen, American Fork, UT (US);

Inventors:

Krzysztof Kozaczek, Midway, UT (US);

Sterling Cornaby, Springville, UT (US);

Steven Liddiard, Springville, UT (US);

Charles Jensen, American Fork, UT (US);

Assignee:

Moxtek, Inc., Orem, UT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 35/30 (2006.01); H01J 35/06 (2006.01); H01J 35/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multiple wavelength x-ray source includes a multi-thickness target, having at least a first and a second thickness. The first thickness can substantially circumscribe the second thickness. An electron beam can be narrowed to impinge primarily upon second thickness or expanded to impinge primarily upon the first thickness while maintaining a constant direction of the beam. This invention allows the target thickness to be optimized for the desired output wavelength without the need to redirect or realign the x-rays towards the target.


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