The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Aug. 26, 2009
Carsten Michaelsen, Geesthacht, DE;
Stefanie Belgard, Ratzeburg, DE;
Juergen Graf, Rosengarten, DE;
incoatec GmbH, Geesthacht, DE;
Abstract
An X-ray analysis instrument, in particular, an X-ray diffractometer (), has an X-ray source (; SC) that emits an X-ray beam (), an X-ray optics (), in particular a multi-layer X-ray mirror, and a collimator mechanism (BM), wherein the collimator mechanism (BM) forms an aperture window (') with an aperture opening (′) through which at least part () of the X-ray beam () passes. The collimator mechanism (BM) comprises means for gradual movement of the aperture window (′) in at least one direction (A/B, x, y) transversely to the X-ray beam (), the aperture opening (′) is at least as large as the cross-section () of the X-ray beam () at the location of the aperture window (′), and the path of movement (VW, VW) of the aperture window (′), which is accessible by the collimator mechanism (BM), in the at least one direction (A/B, x, y) is at least twice as large as the extension (RS, RS) of the X-ray beam () at the location of the aperture window (′) in this direction (A/B, x, y). The X-ray analysis instrument offers a wider scope of beam conditioning possibilities.