The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
May. 12, 2008
Keiichi Arita, Utsunomiya, JP;
Keiichi Arita, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A scanning exposure apparatus exposing a substrate to a pattern of an original through a projection optical system while relatively moving the original and the substrate, includes a substrate stage movable while holding the substrate; a measurement system measuring a position of the substrate in an optical-axis direction of the projection optical system; and a controller relatively moving the original and the substrate while controlling a position of the substrate stage in the optical-axis direction, on the basis of the position of the substrate detected by the measurement system. The controller keeps accelerating the substrate stage up to a starting position of the irradiation of the exposure light for a target shot area on the substrate, and during the acceleration, controls the position of the substrate stage in the optical-axis direction, on the basis of a position of a surface of an exposed shot area, which has been exposed previously.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile