The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Mar. 24, 2008
Yunlong Sun, Beaverton, OR (US);
Weisheng Lei, Portland, OR (US);
Hisashi Matsumoto, Hillsboro, OR (US);
Brian Johansen, Hillsboro, OR (US);
Gregg Hardy, Portland, OR (US);
Brian Baird, Oregon City, OR (US);
Yunlong Sun, Beaverton, OR (US);
Weisheng Lei, Portland, OR (US);
Hisashi Matsumoto, Hillsboro, OR (US);
Brian Johansen, Hillsboro, OR (US);
Gregg Hardy, Portland, OR (US);
Brian Baird, Oregon City, OR (US);
Electro Scientific Industries, Inc., Portland, OR (US);
Abstract
An improved method and apparatus for drilling vias in electronic substrates with laser pulses is presented which uses one or more tailored pulses to reduce debris remaining in the via while maintaining system throughput and avoiding damage to the substrate. A tailored pulse is a laser pulse that features a power spike having a peak power 10% higher than the average power of the pulse and lasting less than 50% of the duration of the pulse. Methods and apparatuses for creating tailored pulses by slicing longer duration pulses are shown.