The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Nov. 14, 2007
Mattheus Jacobus Nicolaas Van Stralen, Tilburg, NL;
Johannes Antoon Hartsuiker, Eindhoven, NL;
Antonius Henricus Johannes Petrus Maria Linders Molthoff, Waalre, NL;
Igor Milicevic, Helmond, NL;
Mattheus Jacobus Nicolaas Van Stralen, Tilburg, NL;
Johannes Antoon Hartsuiker, Eindhoven, NL;
Antonius Henricus Johannes Petrus Maria Linders Molthoff, Waalre, NL;
Igor Milicevic, Helmond, NL;
Drake Comteq, B.V., Amsterdam, NL;
Abstract
The present invention relates to an apparatus for carrying out a PCVD process in which one or more doped or undoped glass layers are coated onto the interior of a glass substrate tube. The apparatus comprises an applicator having an inner wall and an outer wall and a microwave guide that opens into the applicator. The applicator extends around a cylindrical axis and which is provided with a passage adjacent to the inner wall, through which the microwaves supplied via the microwave guide can exit, over which cylindrical axis the substrate tube can be positioned, while the applicator is fully surrounded by a furnace that extends over the cylindrical axis.