The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Apr. 20, 2005
Donald A. Tomalia, Midland, MI (US);
Douglas R. Swanson, Mt. Pleasant, MI (US);
Baohua Huang, Mt. Pleasant, MI (US);
Veera Reddy Pulgam, Mt. Pleasant, MI (US);
Donald A. Tomalia, Midland, MI (US);
Douglas R. Swanson, Mt. Pleasant, MI (US);
Baohua Huang, Mt. Pleasant, MI (US);
Veera Reddy Pulgam, Mt. Pleasant, MI (US);
Dendritic Nanotechnologies, Inc., Midland, MI (US);
Abstract
Poly(ester-acrylate) and poly(ester/epoxide) dendrimers. These materials can be synthesized by utilizing the so-called 'sterically induced stoichiometric' principles. The preparation of the dendrimers is carried out by reacting precursor amino/polyamino-functional core materials with various branch cell reagents. The branch cell reagents are dimensionally large, relative to the amino/polyamino-initiator core and when reacted, produce generation=1 dendrimers directly in one step. There is also a method by which the dendrimers can be stabilized and that method is the reaction of the dendrimers with surface reactive molecules to pacify the reactive groups on the dendrimers.