The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Sep. 14, 2005
Applicants:
Ayumi Higuchi, Kyoto, JP;
Kenichiro Arai, Kyoto, JP;
Inventors:
Ayumi Higuchi, Kyoto, JP;
Kenichiro Arai, Kyoto, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/24 (2006.01); B08B 3/04 (2006.01); B08B 3/10 (2006.01); B08B 3/14 (2006.01); B01D 19/00 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
Abstract
A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.