The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2011

Filed:

May. 07, 2007
Applicants:

Hyuk Sang Yoon, Goyang-si, KR;

Hwan Kyu Yoo, Osan-si, KR;

Byung Han Yun, Daegu, KR;

Inventors:

Hyuk Sang Yoon, Goyang-si, KR;

Hwan Kyu Yoo, Osan-si, KR;

Byung Han Yun, Daegu, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25B 9/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sputtering apparatus includes a susceptor having a substrate and a plurality of target devices facing the substrate and substantially parallel to each other, each target device being rotatable.


Find Patent Forward Citations

Yoon, Hyuk. (2011). Sputtering apparatus, method of driving the same, and method of manufacturing substrate using the same (U.S. Patent No. 7981263). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7981263

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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