The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Aug. 07, 2006
Tong Fang, Morganville, NJ (US);
Alexander Zouhar, Hillsborough, NJ (US);
Gozde Unal, West Windsor, NJ (US);
Gregory G. Slabaugh, Princeton, NJ (US);
Jason Jenn-kwei Tyan, Princeton, NJ (US);
Fred Mcbagonluri, East Windsor, NJ (US);
Tong Fang, Morganville, NJ (US);
Alexander Zouhar, Hillsborough, NJ (US);
Gozde Unal, West Windsor, NJ (US);
Gregory G. Slabaugh, Princeton, NJ (US);
Jason Jenn-Kwei Tyan, Princeton, NJ (US);
Fred McBagonluri, East Windsor, NJ (US);
Siemens Corporation, Iselin, NJ (US);
Abstract
A method identifying apertures of ear impressions is disclosed. A plurality of contour lines associated with an ear impression are determined and a difference value between a value of a characteristic, such as the diameter, of each contour line and that characteristic of an adjacent contour line is determined. The aperture is identified as being that contour line having the greatest difference value. The contour lines are determined by identifying where a plane intersects the surface of the graphical representations. In another embodiment, the contour lines are assigned a weight. A contour index is then calculated for each contour line as a function of the difference value and these weights. According to this embodiment, the aperture is identified as being a contour line that is adjacent to that contour line having the greatest contour index.