The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
May. 08, 2008
Steven R. J. Brueck, Albuquerque, NM (US);
Alexander Neumann, Albuquerque, NM (US);
Yuliya V. Kuznetsova, Albuquerque, NM (US);
Steven R. J. Brueck, Albuquerque, NM (US);
Alexander Neumann, Albuquerque, NM (US);
Yuliya V. Kuznetsova, Albuquerque, NM (US);
STC.UNM, Albuquerque, NM (US);
Abstract
Exemplary embodiments provide an image interferometric microscope (IIM) and methods for image interferometric microscopy. The disclosed IIM can approach the linear systems limits of optical resolution by using a plurality of off-axis illuminations to access high spatial frequencies along with interferometric reintroduction of a zero-order reference beam on the low-NA side of the optical system. In some embodiments, a thin object can be placed normal to the optical axis and the frequency space limit can be extended to about [(1+NA)n/λ], where NA is the numerical-aperture of the objective lens used, n is the refraction index of the transmission medium and λ is an optical wavelength. In other embodiments, tilting the object plane can further allow collection of diffraction information up to the material transmission bandpass limited spatial frequency of about 2n/λ.