The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

Dec. 27, 2006
Applicants:

Shingo Uchiyama, Kanagawa, JP;

Fusao Shimokawa, Kanagawa, JP;

Johji Yamaguchi, Kanagawa, JP;

Kunihiko Sasakura, Kanagawa, JP;

Hiromu Ishii, Kanagawa, JP;

Inventors:

Shingo Uchiyama, Kanagawa, JP;

Fusao Shimokawa, Kanagawa, JP;

Johji Yamaguchi, Kanagawa, JP;

Kunihiko Sasakura, Kanagawa, JP;

Hiromu Ishii, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

When a mirror () rotates with a maximum angle, a distance from the rotation center of the mirror () to the edge of the mirror () along a direction horizontal to an electrode substrate () is larger than a distance from a perpendicular, perpendicular to the horizontal direction and extending through the rotation center, to the distal end of an electrode (-) along the horizontal direction. Even when the mirror () rotates to come into contact with the electrode substrate (), since the electrode (-) does not exist at a position with which the mirror () comes into contact when rotating, the mirror () and the electrode (-) can be prevented from being electrodeposited.


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