The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Sep. 03, 2004
Applicants:
Woon-yong Park, Kyungki-do, KR;
Jong-soo Yoon, Choongcheongnam-do, KR;
Inventors:
Woon-Yong Park, Kyungki-do, KR;
Jong-Soo Yoon, Choongcheongnam-do, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1343 (2006.01); G02F 1/1345 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention is directed to simultaneously etching thin films to different uniform depths depending on positions by using a photoresist pattern having different thickness depending on positions as an etch mask in order to form a contact hole for a gate pad along with at least one other layer, or a data wire and a semiconductor pattern, via a single photolithography step.