The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

Mar. 19, 2004
Applicants:

Hiroyuki Kurimura, Tokyo, JP;

Jun Watanabe, Tokyo, JP;

Takeshi Oda, Tokyo, JP;

Norihiro Shimizu, Tokyo, JP;

Inventors:

Hiroyuki Kurimura, Tokyo, JP;

Jun Watanabe, Tokyo, JP;

Takeshi Oda, Tokyo, JP;

Norihiro Shimizu, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 53/02 (2006.01); C08F 297/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

To provide a block copolymer composition excellent in balance of transparency, impact resistance, etc. in the form of not only an excluded product and a blow molded product but also an injection molded product. A linear block copolymer composition having at least three types of polymer blocks with different molecular weights each comprising a vinyl aromatic hydrocarbon as monomer units, wherein the molecular weight distribution of a mixture of the polymer blocks is within a specific range, and in GPC of the mixture, M/Mis within a specific range, where Mis the peak top molecular weight corresponding to a peak at which the peak top molecular weight becomes maximum among peaks forming a proportion of the area of at least 30% to the whole peak area, and M2 is the peak top molecular weight corresponding to a peak at which the peak top molecular weight becomes minimum among peaks at which the peak top molecular weight is at most 50,000 and which form a proportion of the area of at least 20% to the whole peak area.


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