The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

Dec. 09, 2008
Applicants:

Yonghan Roh, Seongnam-si, KR;

Kyoungseob Kim, Daegu, KR;

Seokwon Jeong, Suwon-si, KR;

Hyungjin Kim, Suwon-si, KR;

Sungha Park, Suwon-si, KR;

Inventors:

Yonghan Roh, Seongnam-si, KR;

Kyoungseob Kim, Daegu, KR;

Seokwon Jeong, Suwon-si, KR;

Hyungjin Kim, Suwon-si, KR;

Sungha Park, Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are methods of forming nano-devices. One of the methods includes forming a nano-scale self-assembly material layer on a substrate formed of at least one layer, forming a mask layer on the self-assembly material layer, performing a surface treatment process on the substrate using the mask layer as a mask, and removing the self-assembly material layer. Accordingly, it is possible to fabricate nano-devices through a nano-scale substrate patterning process, ion implantation process and etching process, without using a light source.


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