The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Mar. 28, 2007
Katsumi Kushiya, Tokyo, JP;
Yousuke Fujiwara, Tokyo, JP;
Katsumi Kushiya, Tokyo, JP;
Yousuke Fujiwara, Tokyo, JP;
Showa Shell Sekiyu K.K., Tokyo, JP;
Abstract
Before a buffer layer deposition step P, a pre-rinse step Pis provided to remove deposits deposited on the surface of a CIS-based light absorbing layerD. Thus, the disturbing factors of the formation reaction of the buffer layer are removed, thereby to improve the coverage of the buffer layer, and to hold the transparency thereof. In addition, a rinse step Pis provided after the step P. Thus, the colloidal solid matter remaining on the buffer layer surface is cleaned and removed with a rinse solution, thereby to hold the high resistivity. The rinse solution from a second rinse tank of the step Pis re-used. After the step P, a draining/drying step Pis provided. After drying, an n-type window layer (transparent conductive film) is deposited.