The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Feb. 13, 2009
Takashi Murakami, Kanagawa, JP;
Takashi Murakami, Kanagawa, JP;
Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;
Abstract
A semiconductor device manufacturing method, a semiconductor device manufacturing equipment and a computer readable medium storing a computer program provide for easily identifying a cause of a deviation of pattern dimensions from the objective dimension. A first storage section stores a relation between a PEB temperature and a photoresist dimension of a post-lithography. A second storage section stores a relation between a PEB temperature and a post-etching dimension. A primary correction section determines a first corrected PEB temperature for conforming the photoresist dimension of a post-lithography to the objective dimension, using the relation data stored in the first storage section. A secondary correction section determines the second corrected PEB temperature for conforming the post-etching dimension using the first corrected PEB temperature to the objective dimension, using the relation data stored in the second storage section.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile