The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

May. 20, 2005
Applicants:

Yoshihiko Takano, Ibaraki, JP;

Masanori Nagao, Ibaraki, JP;

Minoru Tachiki, Ibaraki, JP;

Hiroshi Kawarada, Kanagawa, JP;

Hitoshi Umezawa, Tokyo, JP;

Kensaku Kobayashi, Tokyo, JP;

Inventors:

Yoshihiko Takano, Ibaraki, JP;

Masanori Nagao, Ibaraki, JP;

Minoru Tachiki, Ibaraki, JP;

Hiroshi Kawarada, Kanagawa, JP;

Hitoshi Umezawa, Tokyo, JP;

Kensaku Kobayashi, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01); C23C 16/00 (2006.01); C23C 8/00 (2006.01); H05H 1/30 (2006.01); H05H 1/24 (2006.01); B01J 3/06 (2006.01); D01C 5/00 (2006.01); D01F 9/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A heavily boron-doped diamond thin film having superconductivity is deposited by chemical vapor deposition using gas mixture of at least carbon compound and boron compound, including hydrogen. An advantage of the diamond thin film deposited by the chemical vapor deposition is that it can contain boron at high concentration, especially in (111) oriented films. The boron-doped diamond thin film deposited by the chemical vapor deposition shows the characteristics of typical type II superconductor.


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