The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

Jul. 05, 2007
Applicants:

Aya Imada, Tokyo, JP;

Toru Den, Tokyo, JP;

Inventors:

Aya Imada, Tokyo, JP;

Toru Den, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for producing a patterned structure comprises imprinting a first pattern by pressing a stamper having a projection-depression configuration on the surface against an imprint-work layer, and imprinting a second pattern by displacing relatively the stamper from the position of the first pattern to another position on the imprint-work layer and then pressing the stamper against the imprint-work layer.


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