The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

Feb. 13, 2007
Applicants:

Hidetaka Matsuuchi, Wakayama, JP;

Ryuichi Iwasaki, Wakayama, JP;

Hirofumi Mankawa, Wakayama, JP;

Shigeru Masuda, Wakayama, JP;

Hirofumi Hayashi, Wakayama, JP;

Masaaki Mike, Wakayama, JP;

Inventors:

Hidetaka Matsuuchi, Wakayama, JP;

Ryuichi Iwasaki, Wakayama, JP;

Hirofumi Mankawa, Wakayama, JP;

Shigeru Masuda, Wakayama, JP;

Hirofumi Hayashi, Wakayama, JP;

Masaaki Mike, Wakayama, JP;

Assignee:

Saian Corporation, Wakayama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); B23K 9/00 (2006.01); B23K 9/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.


Find Patent Forward Citations

Loading…