The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2011

Filed:

Aug. 18, 2006
Applicants:

Srikanth Ranganathan, Mountain View, CA (US);

Paul Bernatis, Sunnyvale, CA (US);

Joel Gamoras, Vallejo, CA (US);

Chao Liu, San Jose, CA (US);

J. Wallace Parce, Palo Alto, CA (US);

Inventors:

Srikanth Ranganathan, Mountain View, CA (US);

Paul Bernatis, Sunnyvale, CA (US);

Joel Gamoras, Vallejo, CA (US);

Chao Liu, San Jose, CA (US);

J. Wallace Parce, Palo Alto, CA (US);

Assignee:

Nanosys, Inc., Palo Alto, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C22C 5/04 (2006.01); B32B 15/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for producing electronic grade metal nanostructures having low levels of contaminants are provided. Monolayer arrays, populations, and devices including such electronic grade nanostructures are described. In addition, novel methods and compositions for production of Group 10 metal nanostructures and for production of ruthenium nanostructures are provided, along with methods for recovering nanostructures from suspension.


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