The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Jan. 10, 2005
Patrick Duvaut, Tinton Falls, NJ (US);
Feng Ouyang, Holmdel, NJ (US);
Patrick Duvaut, Tinton Falls, NJ (US);
Feng Ouyang, Holmdel, NJ (US);
Ikanos Communications, Inc., Fremont, CA (US);
Abstract
A technique for real-time formation of optimal power spectral density masks is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for real-time formation of optimal power spectral density masks. The method may comprise sensing line conditions in a communication medium, wherein the communication medium is capable of carrying signals in a plurality of tones. The method may also comprise determining, in real-time, one or more power spectral density masks that substantially optimize transmissions of the signals in the plurality of tones. The method may further comprise transmitting the signals in the plurality of tones based on the one or more power spectral masks.