The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Sep. 21, 2007
Yoshitomo Nagahashi, Takasaki, JP;
Yoshitomo Nagahashi, Takasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and the projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space, a supply path configured to supply the liquid to the supply nozzle, a bypass which branches from the supply path, and a supply control valve configured to change a flow rate of the liquid supplied from the supply path to the supply nozzle and a flow rate of the liquid supplied from the supply path to the bypass.