The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7973222 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 05, 2011

Filed:

Dec. 03, 2004
Applicants:

Katsura Izui, Kyoto, JP;

Limei Chen, Kyoto, JP;

Nobuo Kato, Kyoto, JP;

Yasuyoshi Sakai, Kyoto, JP;

Hiroya Yurimoto, Kyoto, JP;

Inventors:

Katsura Izui, Kyoto, JP;

Limei Chen, Kyoto, JP;

Nobuo Kato, Kyoto, JP;

Yasuyoshi Sakai, Kyoto, JP;

Hiroya Yurimoto, Kyoto, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 15/31 (2006.01); C12N 15/52 (2006.01); C12N 15/82 (2006.01); A01H 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to this invention, by introducing genes encoding hexulose-6-phosphate synthase and 6-phosphohexulose isomerase into a plant to have the genes expressed in the chloroplast of the plant, a transgenic plant having a pathway to assimilate formaldehyde through the Calvin cycle is provided. The transgenic plant according to this invention has resistance to formaldehyde and is capable of reducing the level of environmental formaldehyde significantly. Therefore, it is assumed that the transgenic plant according to this invention can be used to purify environmental condition, by placing it in a residence or in an office.


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Izui, Katsura. (2011). Method to confer formaldehyde-resistance to a plant, and a method to have a plant absorb enviromental formaldehyde (U.S. Patent No. 7973222). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7973222

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