The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2011

Filed:

Feb. 11, 2010
Applicant:

Silvia Armini, Terni, IT;

Inventor:

Silvia Armini, Terni, IT;

Assignees:

IMEC, Leuven, BE;

Katholieke Universiteit Leuven (KUL), Leuven, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 3/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

Polymer particles of improved mechanical hardness are provided, the polymer particles being subjected to a thermal cycle of heating and subsequently cooling. The polymer particles comprise combinations of preferably three monomers, the monomers having hydrophilic and hydrophobic groups in their polymer chain in order to achieve preferential orientation of the polymer chains in a polar solvent after applying the heating cycles of the invention (for example, but not limited to, polymethylmethacrylate and polystyrene based terpolymers and copolymers). Polymeric abrasives used in slurry compositions for polishing copper and their use in a chemical mechanical polishing method are also provided.


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