The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Feb. 24, 2003
Erik C. Houge, Orlando, FL (US);
John M. Mcintosh, State College, PA (US);
Robert Francis Jones, Clermont, FL (US);
Erik C. Houge, Orlando, FL (US);
John M. McIntosh, State College, PA (US);
Robert Francis Jones, Clermont, FL (US);
Agere Systems Inc., Allentown, PA (US);
Abstract
A system () for monitoring and controlling a fabrication process includes at least a first subsystem (), a crystallographic analysis subsystem (), and a second subsystem (), wherein the first subsystem and second subsystem perform respective fabrication steps on a workpiece. The crystallographic analysis subsystem may be coupled to both the first subsystem and second subsystem. The analysis subsystem acquires crystallographic information from the workpiece after the workpiece undergoes a fabrication step by the first subsystem and then provides information, based on the crystallographic information acquired, for modifying parameters associated with the respective fabrication steps. The system may also include neural networks () to adaptively modify, based on historical process data (), parameters provided to the respective fabrication steps. The analysis subsystem may include a electromagnetic source (), a detector (), a processor (), a controller () and a scanning actuator ().