The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
May. 20, 2008
Joachim Keinert, Altdorf, DE;
Howard H. Smith, Beacon, NY (US);
Patrick M. Williams, Salt Point, NY (US);
Joachim Keinert, Altdorf, DE;
Howard H. Smith, Beacon, NY (US);
Patrick M. Williams, Salt Point, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention relates to an electromigration analysis method and a system for analyzing one or more nets in a digital integrated circuit design that are at risk of electromigration. The method comprises the steps of providing at least one interconnect between a driver cell and at least one load cell; applying same extracted netlist data for noise and/or timing analysis and for electromigration analysis; modeling the driver cell by a train of trapezoidal voltage pulses transmitted from the driver cell to the one or more load cells through the at least one interconnect; extracting at least a slew rate of a driver voltage signal and/or timing information from a noise and/or timing analysis for the one or more nets; and comparing a locally measured current density in the at least one interconnect to an effective local maximum current density limit of the at least one interconnect.