The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Jan. 22, 2008
Applicants:
Jin Xie, Longmont, CO (US);
Mats Oberg, Cupertino, CA (US);
Jingfeng Liu, Longmont, CO (US);
Zachary Keirn, Loveland, CO (US);
Inventors:
Jin Xie, Longmont, CO (US);
Mats Oberg, Cupertino, CA (US);
Jingfeng Liu, Longmont, CO (US);
Zachary Keirn, Loveland, CO (US);
Assignee:
Marvell International Ltd., Hamilton, BM;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A media defect compensation system and method may decouple effects of asymmetry from baseline error compensation computations. In some embodiments, a switching mechanism passes a baseline error signal into a baseline loop when a determination is made that a baseline error signal is not affected by asymmetry, and otherwise freezes the baseline loop when asymmetry may influence baseline error calculations.