The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
May. 20, 2008
Paul S. Mclaughlin, Poughkeepsie, NY (US);
Sujatha Sankaran, Wappingers Falls, NY (US);
Theodorus E. Standaert, Pine Bush, NY (US);
Paul S. McLaughlin, Poughkeepsie, NY (US);
Sujatha Sankaran, Wappingers Falls, NY (US);
Theodorus E. Standaert, Pine Bush, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A semiconductor interconnect structure and method providing an embedded barrier layer to prevent damage to the dielectric material during or after Chemical Mechanical Polishing. The method employs a combination of an embedded film, etchback, using either selective CoWP or a conformal cap such as a SiCNH film, to protect the dielectric material from the CMP process as well as subsequent etch, clean and deposition steps of the next interconnect level.