The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2011

Filed:

Jul. 11, 2008
Applicants:

Kyoji Nakamura, Koza-gun, JP;

Takayuki Uozumi, Machida, JP;

Inventors:

Kyoji Nakamura, Koza-gun, JP;

Takayuki Uozumi, Machida, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12M 1/34 (2006.01); C12M 3/00 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present application includes a culture chamber, an observation chamber having an optical system of observation to observe samples to be cultured in the culture chamber, and a movement stage provided at a boundary which separates the culture chamber and the observation chamber, functioning as a wall to maintain an environment of both of the chambers, bearing the samples, and moving the samples on a light axis of observation of the optical system of observation. Due to such an arrangement, a culture observation equipment which has good response and excellent environmental resistance can be achieved, preventing problems such as the overall size of the device became large, maintenance work was difficult, and device cost became expensive.


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