Near field exposure mask, method of forming resist pattern using the mask, and method of producing device

Abstract

Provided are a near field exposure mask which can suppress heat generation of a mask during exposure and can also suppress variation in size of a resist pattern for each shot, and a resist pattern forming method using the same. The near field exposure mask includes a transparent mask matrix l; a light shielding layer lformed above the transparent mask matrix land containing silicon; a reflective layer lformed between the transparent mask matrix land the light shielding layer l; and an opening pattern provided in the reflective layer land the light shielding layer land being less in size than an exposure wavelength λ (nm), wherein the reflectance at an interface between the transparent mask matrix land the reflective layer lis higher than a reflectance at an interface between a transparent mask matrix and a light shielding layer formed on the transparent mask matrix and containing silicon of a near field exposure mask which has no reflective layer between the transparent mask matrix and the light shielding layer.