The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Mar. 13, 2009
Stephanie Booz Norris, Rocky Point, NC (US);
Stephanie Booz Norris, Rocky Point, NC (US);
Atex Technologies, Inc., Pinebluff, NC (US);
Abstract
An elongation resistant fabric, devices, and methods can include an elongation resistant yarn laid in a knit structure of the fabric between knit loops in selected adjacent wales and partially about the loop in one adjacent wale in predetermined courses. In this manner, the fabric can be adapted to resist elongation in a walewise direction along the length of the fabric. The elongation resistant fabric can be a mesh fabric. In a mesh fabric, the size and a shape of pores in the fabric can be maintained when the fabric is pulled in the walewise direction. The elongation resistant yarn can have a diameter larger than the individual diameters of other yarns in the fabric. The elongation resistant yarn can be, for example, a monofilament yarn, such as a polypropylene or polyester monofilament yarn.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile