The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2011

Filed:

Jul. 03, 2007
Applicant:

Sven Trogisch, Dresden, DE;

Inventor:

Sven Trogisch, Dresden, DE;

Assignee:

Qimoda AG, München, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Lithography mask or rewritable mask comprising at least one material with reversible changeable optical properties. Processes for manufacturing a mask, devices for processing a substrate, lithographic systems and semiconductor devices.


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