The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Jun. 26, 2009
Sang-kil Kang, Gyeonggi-do, KR;
Sang-Kil Kang, Gyeonggi-do, KR;
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Abstract
A method for fabricating a semiconductor device includes forming a plurality of pillar structures over a substrate, forming gate electrodes over sidewalls of the pillar structures, forming a sacrificial layer buried between the pillar structures, etching the sacrificial layer and the substrate to form trenches in the substrate, forming first inter-layer insulation patterns buried over the trenches and removing the remaining sacrificial layer at substantially the same time, and forming second inter-layer insulation patterns over the first inter-layer insulation patterns and buried between the pillar structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile