The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Aug. 24, 2007
Hiroshi Haji, Fukuoka, JP;
Kiyoshi Arita, Fukuoka, JP;
Hiroshi Haji, Fukuoka, JP;
Kiyoshi Arita, Fukuoka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
In a laser processing step S, boundary sections among semiconductor elementsof a resist filmare exposed to a laser beam, to thus form in the resist filmboundary grooves—which partition the semiconductor elementsfrom each other—and to uncover a surfaceof a semiconductor waferin the boundary grooves. In a plasma etching step S, the surfaceof the semiconductor waferexposed in the boundary groovesis etched by means of plasma Pf of a fluorine-based gas, to thus separate the semiconductor waferinto individual semiconductor chips' along the boundary grooves. Between the laser processing step Sand the plasma etching step S, there is performed processing pertaining to a boundary-groove-surface smoothing step Sfor smoothing, by means of plasma Po of oxygen gas, surfaces of the boundary grooveshaving assumed an irregular shape in the laser processing step S