The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Jun. 09, 2008
Yunsheng Song, Poughkeepsie, NY (US);
Xu Ouyang, Hopewell Junction, NY (US);
James P. Rice, Danbury, CT (US);
Yunsheng Song, Poughkeepsie, NY (US);
Xu Ouyang, Hopewell Junction, NY (US);
James P. Rice, Danbury, CT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for optimizing multiple process windows in a semiconductor manufacturing process is disclosed. The method comprises performing dependent variable composition on a plurality of dependent variables. Metrology data is joined with the dependent variables, and then a partial least squares regression is performed on the joined data set to obtain a prediction equation, and a variable importance prediction for each process window in a process window set. A set of product limited yield are derived, and the process window, set is adjusted, and the yields recalculated, until an optimal process window set is derived.